What is the best material to use for CMP retaining ring

What is the best material to use for CMP retaining ring ?

Silicon wafers are silicon wafers used in the production of silicon semiconductor circuits, and then mechanical polishing process in the production process of silicon wafers and is a very important link, we usually hear a few inches of wafers, which represents the larger the diameter of the silicon wafer, the better the performance of this silicon wafer, the stronger the embodiment of technical strength, so in the production process of wafers, the yield rate has become a very important condition, which for the wafer surface polishing requirements are also rising, CMP polishing process is also becoming more and more sophisticated, so the polishing process to use the ultimate mature CMP fixed ring

During the wafer polishing process, the CMP retaining ring must hold the wafer during the polishing process. During the polishing process, different chemicals are added, and these liquids can corrode the polished components, so it requires the CMP retaining ring to be able to withstand certain mechanical loads, good flexibility and corrosion resistance, and other characteristics.

To sum up, to manufacture CMP retaining rings, we need processors to have very high processing accuracy and dimensional stability to reduce the scratching of wafers later.

Usually we choose two special engineering plastics: PPS and PEEK to process and produce CMP retaining rings.

PPS material is characterized by high wear resistance, good chemical resistance and solvent resistance, as well as good friction properties, high-sun clean type of material, will not contaminate the wafer, compared to peek CMP fixed ring, pps CMP fixed ring cost is lower, and has formed a complete industrial chain, with the family highlights the cost performance.

PEEK CMP retaining ring has a higher coefficient of friction, compared to PPS CMP retaining ring friction performance is more excellent, has a more comprehensive and stable chemical resistance, a wider range of high temperature resistance, so that peek CMP retaining ring in the long-term high-strength machining environment more stable, in relative time, the same working conditions, longer, but the cost will also be higher compared to some.