PEEK for semiconductor TECAPEEK CMP natural Ensinger

What is CMP RETAINER RING or CMP RETAINING RING, WAFER GUIDE RING etc, CMP RETAINER RING is installed at the bottom of the grinding head to fix the wafer and drive the wafer to rotate with the grinding head to achieve the grinding and polishing effect on the surface of the wafer. It is an important part of the CMP equipment.Pc Cnc Machined Part

Chemical mechanical polishing (CMP) is one of the key processes in semiconductor manufacturing today. In recent years, as the wafer size has become larger, the chip size has become smaller, and the circuit wiring has become thinner. To obtain the ideal coating film thickness and the requirements of coating on an ideal plane during the manufacturing process, the precision requirements of the peripheral components in the CMP process are becoming more and more stringent.Plastic Cnc Machined Part

In the CMP process, the CMP RETAINER RING will be in contact with various materials of slurry, and The CMP RETAINER RING is required to be resistant to chemical corrosion and wear. It also needs to be able to withstand mechanical loads and should have good elasticity, toughness and strength. In order to increase the yield without damaging the wafer, the CMP RETAINER RING also requires extremely high dimensional accuracy.

Chemical mechanical polishing (CMP) is a key process in semiconductor manufacturing. As the wafer size has become larger, the chip size has become smaller, and the circuit wiring has become thinner, the precision requirements of the peripheral components in the CMP process, such as the CMP RETAINER RING, are becoming more and more stringent.Polyamide Machined Part

CMP RETAINER RING

The PRODUCT FEATURES of CMP RETAINER RING produced by our company:

1. RAW MATERIALS: We use high-quality engineering plastic materials, including PPS, PEEK, and PEEK quenched and tempered materials, to ensure high chemical corrosion resistance and wear resistance.

2. MANUFACTURING PROCESS: We follow extremely high product flatness management standards, which help to reduce unnecessary foreign body scratches caused by the CMP RETAINER RING and provide better wafer TTV value compared to other manufacturers' products.

3. CLEANING PROCESS: We use excellent surface treatment technology and cleaning methods to reduce unnecessary foreign body scratches caused by the CMP RETAINER RING.

4. PRICE ADVANTAGE: Relying on China's strong raw material supply capacity and large-scale production, we offer more competitive prices compared to our competitors.

5. JOINT RESEARCH & DEVELOPMENT: We work closely with our customers to improve our products and meet their various process requirements.

6.REFURBISHMENT:We can also provide customers with refurbishment and regeneration services for used products, which can reduce procurement costs for customers and be more environmentally friendly.

7.QUALITY CONTROL: We have strict quality control measures in place to ensure the consistency and reliability of our CMP RETAINER RING products. Each product is inspected and tested before shipment to ensure that it meets our high standards.

8.CUSTOMER SERVICE: Our team is dedicated to providing exceptional customer service and support. We work closely with our customers to understand their needs and requirements, and we strive to exceed their expectations in every way possible.

Usually we choose two special engineering plastics: PPS and PEEK to process and produce CMP retaining rings.

PPS material is characterized by high wear resistance, good chemical resistance and solvent resistance, as well as good friction properties, high-sun clean type of material, will not contaminate the wafer, compared to peek CMP fixed ring, pps CMP fixed ring cost is lower, and has formed a complete industrial chain, with the family highlights the cost performance.

PEEK CMP retaining ring has a higher coefficient of friction, compared to PPS CMP retaining ring friction performance is more excellent, has a more comprehensive and stable chemical resistance, a wider range of high temperature resistance, so that peek CMP retaining ring in the long-term high-strength machining environment more stable, in relative time, the same working conditions, longer, but the cost will also be higher compared to some.